Henry Radamson

Henry Radamson

Publikationer

Artiklar i tidskrifter

Li, J. , Li, Y. , Zhou, N. , Wang, G. , Zhang, Q. , Du, A. , Zhang, Y. , Gao, J. & et al. (2020). A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm. Materials, vol. 13: 3    

Qin, C. , Yin, H. , Wang, G. , Zhang, Y. , Liu, J. , Zhang, Q. , Zhu, H. , Zhao, C. & et al. (2020). A novel method for source/drain ion implantation for 20 nm FinFETs and beyond. Journal of materials science. Materials in electronics, vol. 31, ss. 98-104.  

Zhao, X. , Moeen, M. , Toprak, M. S. , Wang, G. , Luo, J. , Ke, X. , Li, Z. , Liu, D. & et al. (2020). Design impact on the performance of Ge PIN photodetectors. Journal of materials science. Materials in electronics, vol. 31, ss. 18-25.  

Wang, G. , Kolahdouz, M. , Luo, J. , Qin, C. , Gu, S. , Kong, Z. , Yin, X. , Xiong, W. & et al. (2020). Growth of SiGe layers in source and drain regions for 10 nm node complementary metal-oxide semiconductor (CMOS). Journal of materials science. Materials in electronics, vol. 31, ss. 26-33.  

Xiong, W. , Jiang, H. , Li, T. , Zhang, P. , Xu, Q. , Zhao, X. , Wang, G. , Liu, Y. & et al. (2020). SiNx films and membranes for photonic and MEMS applications. Journal of materials science. Materials in electronics, vol. 31, ss. 90-97.  

Liu, J. , Wang, G. , Li, J. , Kong, Z. & Radamson, H. H. (2020). Study of n-type doping in germanium by temperature based PF+ implantation. Journal of materials science. Materials in electronics, vol. 31, ss. 161-166.  

Li, J. , Wang, W. , Li, Y. , Zhou, N. , Wang, G. , Kong, Z. , Fu, J. , Yin, X. & et al. (2020). Study of selective isotropic etching Si1−xGex in process of nanowire transistors. Journal of materials science. Materials in electronics, vol. 31: 1, ss. 134-143.  

Li, J. , Li, Y. , Zhou, N. , Xiong, W. , Wang, G. , Zhang, Q. , Du, A. , Gao, J. & et al. (2020). Study of silicon nitride inner spacer formation in process of gate-all-around nano-transistors. Nanomaterials, vol. 10: 4    

Radamson, H. H. , He, X. , Zhang, Q. , Liu, J. , Cui, H. , Xiang, J. , Kong, Z. , Xiong, W. & et al. (2019). Miniaturization of CMOS. Micromachines, vol. 10: 5    

Lixing, Z. , Xiaolei, W. , Kai, H. , Xueli, M. , Yanrong, W. , Jinjuan, X. , Hong, Y. , Jing, Z. & et al. (2018). Understanding dipole formation at dielectric/dielectric hetero-interface. Applied Physics Letters, vol. 113: 18